KLA引入了新的IC计量系统

Enabling high-performance logic and memory chip manufacturing

MILPITAS, Calif., Feb. 24, 2020 /PRNewswire/ -- Todaybeplay体育下载2(NASDAQ:KLAC)宣布了Archer™750基于成像的覆盖计量系统和Spectrashape™11K光学关键尺寸(“ CD”)集成电路(“ IC”或“芯片”)制造的计量系统。当构造芯片中的每一层时,弓箭手750有助于验证图案特征正确地与以前的层上的特征保持一致,而Spectrashape 11K则监测三维结构的形状,例如晶体管和记忆单元,以确保它们保持保持在规格中。通过识别模式对齐或特征形状的细微变化,这些新的计量系统有助于IC制造商严格控制将高性能记忆和逻辑芯片带入市场所需的复杂过程,以供5G,AI,数据中心和诸如边缘计算。

心理契约的新射手™750覆盖计量system and SpectraShape™ 11k CD and shape metrology system support measurement and control of critical patterning parameters for leading-edge logic, DRAM and 3D NAND devices.

"IC manufacturers are facing process tolerances measured on the atomic scale as they integrate novel structures and new materials into leading-edge chips," said Jon Madsen, senior vice president and general manager of the Metrology division at KLA. "KLA plays a key part in ensuring that these chips can be manufactured cost-effectively with high quality standards. Today I'm proud to announce two additions to our portfolio of metrology solutions, representing the hard work and creative thinking of a top-notch, multi-disciplinary team of engineers and scientists. The new SpectraShape 11k and Archer 750 systems bring much-needed process control capabilities to our fab customers, helping them to produce the innovative electronics that move our world forward."

TheArcher 750 overlay metrology system在存在过程变化的情况下,生成对覆盖误差的准确测量值,同时仅通过基于散射测量法的覆盖系统才能达到以前看到的生产率水平。这个突破性系统在一系列层次上提供了准确,快速的反馈,有助于光刻者识别过程中的流程和提高整体模式完整性,以更快地产量坡道,并更稳定地生产高级逻辑,DRAM和3D NAND设备。

TheSpectraShape 11k CD and dimensional shape metrology systemprovides an unprecedented combination of sensitivity and productivity, and accommodates materials, structures and wafer shapes that were previously inaccessible. With its ability to measure advanced logic, DRAM and 3D NAND device features with high precision and speed, the SpectraShape 11k enables quick identification of process issues and rigorous process monitoring during production.

More information about the new metrology systems and the technology advances that enable their enhanced performance can be found on theportfolio information page.

Numerous Archer 750 and SpectraShape 11k systems have been qualified and are in operation at leading IC manufacturers worldwide, where they provide critical feedback for many of the process steps used to produce innovative electronic devices. The Archer 750 and SpectraShape 11k are integrated with KLA's5D Analyzer®advanced data analysis system, which supports real-time process control, and engineering monitoring and analysis. To maintain the high performance and productivity demanded by chip manufacturers, the Archer 750 and SpectraShape 11k metrology systems are backed byKLA的全球综合服务网络.

关于心理契约:
KLA develops industry-leading equipment and services that enable innovation throughout the electronics industry. We provide advanced process control and process-enabling solutions for manufacturing wafers and reticles, integrated circuits, packaging, printed circuit boards and flat panel displays. In close collaboration with leading customers across the globe, our expert teams of physicists, engineers, data scientists and problem-solvers design solutions that move the world forward. Additional information may be found atwww.kla.com(KLAC-P).

Forward Looking Statements:
Statements in this press release other than historical facts, such as statements regarding the expected performance of the Archer 750 and SpectraShape 11k systems and the economic effects of metrology measurements for wafer, equipment, materials and chip manufacturing facilities, are forward-looking statements, and are subject to the Safe Harbor provisions created by the Private Securities Litigation Reform Act of 1995. These forward-looking statements are based on current information and expectations and involve risks and uncertainties. Actual results may differ materially from those projected in such statements due to various factors, including delays in the adoption of new technologies (whether due to cost or performance issues or otherwise), the introduction of competing products by other companies or unanticipated technology challenges or limitations that affect the implementation, performance or use of KLA's products.

Logo -https://mma.prnewswire.com/media/806571/KLA_Corporation_Logo.jpg

KLA Corporation (PRNewsfoto/KLA Corporation)

CisionView original content to download multimedia:http://www.prnewswire.com/news-releases/kla-indroduces-new-ic-metrology-systems-301010093.html

SOURCE KLA Corporation