MILPITAS, Calif., July 8, 2019 /PRNewswire/ -- Todaybeplay体育下载2(NASDAQ: KLAC) announced the 392x and 295x optical defect inspection systems and the eDR7380™ e-beam defect review system. The new inspection systems are extensions of the company's flagship patterned wafer platforms, featuring advancements in the speed and sensitivity that define optical inspection. The new e-beam review system introduces innovations that cement its value as the essential link between defect and source. This portfolio is designed to accelerate time-to-market for leading-edge 3D NAND, DRAM and logic integrated circuits (ICs) throughout their product lifecycle.

"Manufacturing the next generation of memory and logic chips profitably requires unprecedented process control," said Ahmad Khan, executive vice president of the Global Products Group at KLA. "Device structures are smaller, narrower, taller and deeper, with more complex shapes and new materials. Discriminating defects from benign physical variations—signal from noise—has become an incredibly difficult problem. I'm excited to announce that our optical and e-beam engineering teams have developed a family of innovative, connected defect inspection and review systems, designed to enable our industry to continue to move forward."

The392x and 295x optical patterned wafer defect inspection systems通过利用宽带等离子体照明技术，传感器架构和芯片设计信息集成来实现无与伦比的灵敏度，吞吐量和产量相关的融合水平。因此，新系统提供更快的缺陷发现，加速产量学习，比其行业领先的前辈更全面的内联监控。392X和295x系统使用不同的波长范围来覆盖所有层的检测应用，从浅沟槽隔离通过金属化，包括EUV光刻质量控制。

具有级别的图像质量和在一次测试中提供完整的缺陷帕累托的独特能力，EDR7380电子束晶圆缺陷审查系统provides faster defect sourcing in development, faster excursion detection, and more accurate, actionable data during production. The system is equipped to support review of fragile EUV lithography process layers. Unique linkage to KLA inspectors reduces time to results, enables access to a broad range of KLA-specific applications, and improves inspection sensitivity through smart sampling and efficient exchange of defect data.

The 392x, 295x and eDR7380 systems are available as new systems or as upgrades from previous-generation 39xx, 29xx or eDR7xxx systems. These systems are designed for future extendibility to protect a fab's capital investment.

所有新系统都在全球领先的IC制造商运营，在那里他们共同努力，使创新的电子设备制造生产。为了保持芯片制造商所需的高性能和生产力，392倍，295倍和EDR7380系统被支持KLA的全球综合服务网络。More information about the new defect inspection and review systems can be found on theportfolio information page。

eDR® is a registered trademark of KLA Corporation.

About KLA:
KLA-Tencor Corporation (aka "KLA Corporation" or "KLA") develops industry-leading equipment and services that enable innovation throughout the electronics industry. We provide advanced process control and process-enabling solutions for manufacturing wafers and reticles, integrated circuits, packaging, printed circuit boards and flat panel displays. In close collaboration with leading customers across the globe, our expert teams of physicists, engineers, data scientists and problem-solvers design solutions that move the world forward. Additional information may be found athttps://www.kla.com/(KLAC-P).

Forward Looking Statements:
Statements in this press release other than historical facts, such as statements regarding the expected performance of the 295x, 392x and eDR7380 systems and the economic effects of defect reduction for wafer, equipment, materials and chip manufacturing facilities, are forward-looking statements, and are subject to the Safe Harbor provisions created by the Private Securities Litigation Reform Act of 1995. These forward-looking statements are based on current information and expectations and involve risks and uncertainties. Actual results may differ materially from those projected in such statements due to various factors, including delays in the adoption of new technologies (whether due to cost or performance issues or otherwise), the introduction of competing products by other companies or unanticipated technology challenges or limitations that affect the implementation, performance or use of KLA's products.

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SOURCE KLA Corporation